Performance information

• Demonstration of selective depth controllability in photoelectrochemical etching using evanescent light　　　　　　　　　　　　　　　
  Kaito MIYAKODA; Naoto TAKAHASHI; Hirofumi HIDAI; Sho ITOH; Souta MATSUSAKA
  Journal of the Japan Society for Abrasive Technology, Volume：70, Number：7, First page：400, Last page：407, Jul. 2026, [Reviewed], [Lead], ［Domestic magazine］
  We propose a novel depth-selective photoelectrochemical (PEC) etching method using evanescent light. Evanescent light is localized near the total-internal-reflection interface. We propose this localization can be applied to control the etch depth. To demonstrate the concept, we etched a GaAs wafer with a pre-existing groove. When using evanescent light, areas with groove depths greater than 0.2 µm were left largely unetched, because of the localization. In contrast, propagating light etched uniformly, regardless of the groove depth. This result demonstrates that evanescent light-based PEC etching selectively removes material only near the interface.
  Japanese, Scientific journal
  DOI：https://doi.org/10.11420/jsat.25-00022
  DOI ID：10.11420/jsat.25-00022, 共同研究・競争的資金等ID：53352512
• Photoelectrochemical etching of semiconductor induced by evanescent light
  Kaito Miyakoda; Hirofumi Hidai; Sho Itoh; Souta Matsusaka
  Applied Physics A, Volume：131, Number：11, First page：891, Last page：891, Oct. 2025, [Reviewed], [Lead], ［International magazine］
  Abstract
  
  A novel photoelectrochemical etching method for semiconductor was introduced, utilizing evanescent light as the source to confine the etching depth. Evanescent light, generated under total internal reflection, is localized near the reflective interface. Since the etching rate correlates with light intensity, the etching profile is determined by the spatial decay of the evanescent field from the interface. Time-resolved measurements revealed that the etching depth is limited to approximately 900 nm from the total internal reflection interface. The shape of the etched cavity reflects the intensity distribution of the evanescent light. In addition, a theoretical model was developed based on the hypothesis that the etching rate is proportional to the light intensity when using evanescent light. The experimental etching results are consistent with this theoretical model. These findings suggest that consistent etching profiles can be achieved regardless of the initial surface morphology under optimized conditions, as the evanescent light intensity distribution is independent of surface topography. This etching technology has the potential to enable non-contact or zero-defect surface flattening.
  Springer Science and Business Media LLC, English, Scientific journal
  DOI：https://doi.org/10.1007/s00339-025-09024-6
  DOI ID：10.1007/s00339-025-09024-6, ISSN：0947-8396, eISSN：1432-0630, 共同研究・競争的資金等ID：53352512
• Curved hole drilling by laser manipulation of a heat spot inside glass　　　　　　　　　　　　　　　
  Kaito Miyakoda; Koki Sunayama; Kosuke Sakamoto; Daijiro Tokunaga; Hirofumi Hidai; Souta Matsusaka
  Precision Engineering, Volume：81, First page：1, Last page：7, May 2023, [Reviewed], [Lead], ［International magazine］
  Elsevier BV, English, Scientific journal
  DOI：https://doi.org/10.1016/j.precisioneng.2023.01.008
  DOI ID：10.1016/j.precisioneng.2023.01.008, ISSN：0141-6359
• Soret effect in metal-particle doped glass by focused laser heating　　　　　　　　　　　　　　　
  Kaito Miyakoda; Sho Itoh; Hirofumi Hidai; Souta Matsusaka
  Laser-based Micro- and Nanoprocessing XVII, First page：46, Last page：46, Mar. 2023, [Lead], ［International magazine］
  SPIE, English, International conference proceedings
  DOI：https://doi.org/10.1117/12.2651075
  DOI ID：10.1117/12.2651075
• Surface Profile Transfer Using Light Leaked from Cylindrical Surface of Glass Fiber
  Yutaka Monma; Kaito Miyakoda; Hirofumi Hidai; Souta Matsusaka
  Journal of the Japan Society for Precision Engineering, Volume：89, Number：1, First page：127, Last page：132, Jan. 2023, [Reviewed], ［Domestic magazine］
  Japan Society for Precision Engineering, Japanese, Scientific journal
  DOI：https://doi.org/10.2493/jjspe.89.127
  DOI ID：10.2493/jjspe.89.127, ISSN：0912-0289, eISSN：1882-675X

• The Professional Designer's Works of Refuse Trucks
  精密工学会学生編集委員WG0
  Journal of the Japan Society for Precision Engineering, Volume：88, Number：1, First page：38, Last page：43, 05 Jan. 2022
  公益社団法人 精密工学会, Japanese
  DOI：https://doi.org/10.2493/jjspe.88.38
  DOI ID：10.2493/jjspe.88.38, ISSN：0912-0289, eISSN：1882-675X

• フッ化カルシウムの３次元レーザスライシング　　　　　　　　　　　　　　　
  松山優斗; 都田海人; 山田洋平; 池野順一
  Sep. 2026
  Sep. 2026 - Sep. 2026, Japanese, Oral presentation
• Delamination of GaN Thin Films Using the Crack-Chain Method　　　　　　　　　　　　　　　
  Kohei UCHIDA; Ryohei ENDO; Kaito MIYAKODA; Yohei YAMADA; Junichi IKENO
  ABTEC2026, Sep. 2026, [Domestic conference]
  Aug. 2026 - Sep. 2026, Japanese, Oral presentation, Sendai, Japan
• 研磨炭に学ぶ異方性砥石作製の試み ～マイクロハニカム構造の試作～　　　　　　　　　　　　　　　
  原 幸汰; 笹沼 彩冬; 都田 海人; 山田 洋平; 池野 順一
  Aug. 2026, [Domestic conference]
  Aug. 2026 - Sep. 2026, Japanese, Oral presentation, Japan
• The effect of polarization in photoelectrochemical etching induced by evanescent light　　　　　　　　　　　　　　　
  Kaito Miyakoda; Hirofumi Hidai; Souta Matsusaka
  Mar. 2026, [Domestic conference]
  Mar. 2026 - Mar. 2026, Japanese, Oral presentation, Saitama, Japan
• Feasibility study on planarization by electrodeless photoelectrochemical etching with evanescent light　　　　　　　　　　　　　　　
  Kaito Miyakoda; Naoto Takahashi; Hirofumi Hidai; Sho Itoh; Souta Matsusaka
  The 27th International Symposium on Advances in Abrasive Technology (ISAAT2025), Nov. 2025, [International conference]
  Nov. 2025 - Nov. 2025, English, Oral presentation, Numazu, Japan
  共同研究・競争的資金等ID：53352512
• Demonstration of the electrodeless photoelectrochemical etching with evanescent light　　　　　　　　　　　　　　　
  Kaito Miyakoda; Hirofumi Hidai; Sho Itoh; Souta Matsusaka
  Progress in Ultrafast Laser Modifications of Materials(PULMM2025), Jun. 2025, [International conference]
  Jun. 2025 - Jul. 2025, English, Poster presentation, Villars-sur-Ollon, Switzerland
  共同研究・競争的資金等ID：53352512
• Demonstration of etch depth limitation by evanescent-light-assisted etching of n-GaAs　　　　　　　　　　　　　　　
  Kaito Miyakoda; Hirofumi Hidai; Sho Itoh; Souta Matsusaka
  Lasers in Manufacturing 2025 (LiM 2025), Jun. 2025, [International conference]
  Jun. 2025 - Jun. 2025, English, Oral presentation, Munich, Germany
  共同研究・競争的資金等ID：53352512
• Study on photoelectrochemical (PEC) etching of GaAs using evanescent light　　　　　　　　　　　　　　　
  Kaito Miyakoda; Hirofumi Hidai; Sho Itoh; Souta Matsusaka
  Abrasive Technology Conference (ABTEC2023, Aug. 2023, [Domestic conference]
  Aug. 2023 - Aug. 2023, Japanese, Oral presentation, Yonago, Japan
• Feasibility study on fabrication of curved hole using fiber fuse with laser scanning　　　　　　　　　　　　　　　
  Kaito Miyakoda; Hirofumi Hidai; Sho Itoh; Souta Matsusaka
  Progress in Ultrafast Laser Modification of Materials (PULMM2023), Jun. 2023, [International conference]
  Jun. 2023 - Jun. 2023, English, Poster presentation, Nikko, Japan
• Soret effect in metal particle doped glass by focused laser heating　　　　　　　　　　　　　　　
  Kaito Miyakoda; Hirofumi Hidai; Sho Itoh; Souta Matsusaka
  SPIE Photonics West 2023, Feb. 2023, [International conference]
  Jan. 2023 - Feb. 2023, English, Oral presentation, San Francisco, United States
• Curved hole drilling in silica glass by fiber fuse with a scanned laser beam　　　　　　　　　　　　　　　
  Kaito Miyakoda; Koki Sunayama; Kosuke Sakamoto; Hirofumi Hidai; Souta Matsusaka
  The 19th International Conference on Precision Engineering (ICPE2022), Dec. 2022, [International conference]
  Nov. 2022 - Dec. 2022, English, Oral presentation, Nara, Japan
• Direction Control of Plasma Running in Glass by Laser Scanning　　　　　　　　　　　　　　　
  Kaito Miyakoda; Koki Sunayama; Kosuke Sakamoto; Souta Matsusaka
  Oct. 2022, [Domestic conference]
  Oct. 2022 - Oct. 2022, Japanese, Oral presentation, Kanazawa, Japan
• A Study on the Transfer of Contour Shapes via Etching Using Light Leaking from the Cylindrical Surface of a Glass Rod　　　　　　　　　　　　　　　
  Yutaka Monma; Kaito Miyakoda; Hidai Hirofumi; Souta Matsusaka
  Mar. 2022, [Domestic conference]
  Mar. 2022 - Mar. 2022, Japanese, Oral presentation

• Apr. 2026 - Present
  機械工学実験Ⅱ, Undergraduate special subjects

• Jan. 2026 - Present
• Mar. 2021 - Present

• Elucidation of Polarization-Dependent Mechanisms in Evanescent-Light-Induced Etching and Their Application to Process Control　　　　　　　　　　　　　　　
  Japan Society for the Promotion of Science (JSPS), Grants-in-Aid for Scientific Research (KAKENHI), Grant-in-Aid for Research Activity Start-up, Jul. 2026 - Mar. 2028
  Kaito Miyakoda, Saitama University, Principal investigator
  Grant amount(Total)：2730000, Direct funding：2100000, Indirect funding：630000
  Competitive research funding, Grant number：26K24598
• 局在光を活用したエッチングによる完全平滑表面創製技術の確立　　　　　　　　　　　　　　　
  Apr. 2024 - Mar. 2026
  Grant amount(Total)：1500000, Direct funding：1500000
  Competitive research funding, Grant number：24KJ0524
  論文ID：54341616, 講演・口頭発表等ID：53398157, 受賞ID：53375509